Direct Write technology denotes a group of processes which are used to precisely deposit materials onto a substrate in defined locations.  In this talk two direct write methods will be presented: (a) Collimated Aerosol Beam - Direct Write (CAB-DW) and (b) STM-controlled capillary-based nanolithography.

1. (a)Under proper conditions the Saffman force acting on aerosol particles in gas flowing through a micro-capillary becomes significant, thereby causing noticeable migration of particles towards the centerline of the capillary.  It is possible to design a micro-capillary system capable of generating a collimated aerosol beam in which aerosol particles stay very close to a capillary center line.  The lines deposited by CAB-DW are shown to exhibit widths of 5 microns.  Material deposition based upon directed aerosol flow has the potential of finding applications in the field of flexible electronics, sensors and solar cells.
   

2. (b)This method employs the Scanning Tunneling Microscope with gold-coated nano-capillary as the fluid delivery system and allows various fluids to be deposited on conductive substrates.  Touching the substrate with the liquid meniscus causes the liquid deposition on the substrate.  Comparison of theoretical modeling with experimental observations in micro-scale will be shown and discussed.  This material deposition method has the potential of finding applications in bio- and nano-technology.