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Research

Research

The current research topics are in the area of PLASMA PROCESSING INDUCED DAMAGE to Silicon (MOSFETs) and SiGe Devices and damage elimination/reduction by nitrogen or deuterium implantation before gate oxide is grown. This involves extensive device characterization and modeling.

The other current topic is characterization and modeling of Three N-Type Implant Pinned Buried Photodetector using Charge Transfer Model for Ultra High Frame Rate Burst Image Sensors.